Deposition of Al2O3 on Ceramic Substrates by PECVD Method
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F00%3A00003759" target="_blank" >RIV/60461373:22310/00:00003759 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Deposition of Al2O3 on Ceramic Substrates by PECVD Method
Original language description
Low temperature deposition of aluminium oxide films using a plasma enhanced metal-organic chemical vapor deposition technique is described. The plasma was generated by a 40kHz RF. A single molecular source reagent trimethylaluminium, was carra away into
Czech name
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Czech description
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Classification
Type
A - Audiovisual production
CEP classification
CA - Inorganic chemistry
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2000
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
ISBN
80-85988-48-8
Place of publication
Ostrava
Publisher/client name
TANGER Ostrava
Version
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Carrier ID
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