The thermal stability of laser annealed contacts based on palladium
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F00%3A00004387" target="_blank" >RIV/60461373:22310/00:00004387 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
The thermal stability of laser annealed contacts based on palladium
Original language description
The thermal stability of W/Pt/doping element/Pd and Pt/doping element/Pd ohmic contacts with Ge, Si, and Sn in the position of doping elements were investigated. Two stability tests were made, the first at 400 oC and the second at 195 oC.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA106%2F99%2F1437" target="_blank" >GA106/99/1437: Preparation of sensitive layers of chemical sensors by pulsed laser deposition</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2000
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Microelectronic Engineering
ISSN
0167-9317
e-ISSN
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Volume of the periodical
54
Issue of the periodical within the volume
3
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
7
Pages from-to
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UT code for WoS article
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EID of the result in the Scopus database
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