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Immobilised particulate TiO2 catalysts for degradation of organics pollutants. Effect of layer thickness

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F05%3A00013701" target="_blank" >RIV/60461373:22310/05:00013701 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Immobilised particulate TiO2 catalysts for degradation of organics pollutants. Effect of layer thickness

  • Original language description

    Particulate TiO2 layers of various thickness were prepared by sedimentation from suspension and investigated by SEM, UV-VIS spectroscopy, photocurrents and photodegradation rate measurement. In pure electrolyte (Na2SO4) the photocurrent reaches a maximumaround 0.5 #m and then rapidly decreases with increasing thickness. The explanation consists in the fact that with increasing layer thickness the average distance of photogenerated electrons and holes from back contact of electrode increases. This results in higher recombination and lower electron flux (photocurrent) to the back contact. In the presence of oxalic acid photocurrent is about one order higher than in Na2SO4 and it does not decrease with layer thickness. It can be attributed to the strongadsorption of oxalic acid, which is directly oxidized by holes. The stationary concentration of holes is thus very small and the probability that electron/hole pairs will recombine is much lower than in pure electrolyte and does not depen

  • Czech name

    Nanesený částicový TiO2 katalyzátor pro degradaci organických škodlivin. Vliv tloušťky vrstvy

  • Czech description

    Částicové TiO2 vrstvy o různé tloušťce byly připraveny sedimentací ze suspense a zkoumány metodou SEM, UV-VIS spectroskopie, měřením fotoproudů a rychlosti fotodegradace. V čistém elektrolytu (Na2SO4) dosahuje fotoproud maxima okolo 0.5 #m a pak rychle klesá s rosoucí tloušťkou. Vysvětlení spočívá ve skutečnosti, že rostoucí tloušťkou roste vzdálenost fotogenerovaných elektronů a děr od kovového kontaktu elektrody. To vede k vyšší rekombinaci a nižšímu toku elektronůt (fotoproudu) ke kovovému kontaktu elektrody. V přítomnosti kyseliny šťavelové je fotoproud asi o řád vyšší než v Na2SO4 a neklesá se vzrůstem tloušťky vrstvy. To může být přisouzeno silné adsorpci kyseliny šťavelové, která přímo oxidovaná dírami.

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    CH - Nuclear and quantum chemistry, photo chemistry

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GA104%2F02%2F0662" target="_blank" >GA104/02/0662: Application of advanced oxidation processes utilizing solar energy in combination with non-ionogenic selective sorption for water decontamination</a><br>

  • Continuities

    Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2005

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Electrochimica Acta

  • ISSN

    0013-4686

  • e-ISSN

  • Volume of the periodical

    50

  • Issue of the periodical within the volume

    25-26

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    6

  • Pages from-to

    5255-5260

  • UT code for WoS article

  • EID of the result in the Scopus database