Oxygen Ion-Implantation into chromium silicate glasses

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F08%3A00020115" target="_blank" >RIV/60461373:22310/08:00020115 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Oxygen Ion-Implantation into chromium silicate glasses
Original language description
Chromium doped materials are attractive for application as broadband amplifiers or laser source based on the emission of the Cr(IV) in the range of 1200 to 1600 nm. However, this oxidation state of chromium is difficult to reach and stabilize and it depends strongly on the properties of the hosting materials. Here we report on fabrication of the Cr(IV) doped silicate glass. From the literature data it follows that the Cr(IV) is to be more stable in the materials with higher optical basicity. Therefore several silicate glasses with different basicity and containing various amounts of Cr(III) oxide were formulated. The cut and polished glass wafers were then exposed to the ion implantation of oxygen (1) cations. In some of the samples the luminescence inthe desired spectral region really appeared at room temperature as a confirmation of formation of the Cr(IV). Possible effects occurring in the glass during the implantation process, i.e., oxidation of Cr(III) to Cr(IV), cracking of the
Czech name
Oxygen Ion-Implantation into chromium silicate glasses
Czech description
implantace, chrom

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2008
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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