Graphene growth by transfer-free CVD metod using cobalt/nickel catalyst layer

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F18%3A43917069" target="_blank" >RIV/60461373:22310/18:43917069 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.4028/www.scientific.net/MSF.919.207" target="_blank" >http://dx.doi.org/10.4028/www.scientific.net/MSF.919.207</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.4028/www.scientific.net/MSF.919.207" target="_blank" >10.4028/www.scientific.net/MSF.919.207</a>

Result language

angličtina

Original language name

Graphene growth by transfer-free CVD metod using cobalt/nickel catalyst layer

Original language description

Graphene has been long considered for application in electronics manufacturing due to its extraordinary electronic, mechanical and thermal properties. This paper focuses on the graphene preparation onto dielectric substrate using transfer-free chemical vapour deposition (CVD) method with an intermediate catalytic metal layer (cobalt, nickel). Graphene layers were formed via segregation mechanism at temperatures in the range of 850 - 1050 °C onto the metal-dielectric boundary. Evaluated Raman spectra, which reveal the number of graphene layers and their defectivity suggested, that thinner metal layer and balanced ratio of H2:CH4 yield the best results for both cobalt and nickel layer. Spectra showed low amount of defects and the average number of carbon layers between 2-3, however, single-layer graphene (SLG) samples were also prepared. Scanning electron microscopy images showed that graphene domains on larger scale are not fully continuous.

Czech name

—

Czech description

—

Type

J_ost - Miscellaneous article in a specialist periodical

CEP classification

—

OECD FORD branch

20501 - Materials engineering

Project

<a href="/en/project/GA17-00607S" target="_blank" >GA17-00607S: Complex Artificial Electromagnetic Structures and Nanostructures</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2018

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Materials Science Forum

ISSN

0255-5476

e-ISSN

—

Volume of the periodical

919

Issue of the periodical within the volume

January

Country of publishing house

CH - SWITZERLAND

Number of pages

8

Pages from-to

207-214

UT code for WoS article

—

EID of the result in the Scopus database

—