Atomic layer deposition of nio to produce active material for thin-film lithium-ion batteries

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F19%3A43919818" target="_blank" >RIV/60461373:22310/19:43919818 - isvavai.cz</a>

Result on the web

<a href="https://www.mdpi.com/2079-6412/9/5/301/htm" target="_blank" >https://www.mdpi.com/2079-6412/9/5/301/htm</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3390/coatings9050301" target="_blank" >10.3390/coatings9050301</a>

Result language

angličtina

Original language name

Atomic layer deposition of nio to produce active material for thin-film lithium-ion batteries

Original language description

Atomic layer deposition (ALD) provides a promising route for depositing uniform thin-film electrodes for Li-ion batteries. In this work, bis(methylcyclopentadienyl) nickel(II) (Ni(MeCp) 2 ) and bis(cyclopentadienyl) nickel(II) (NiCp 2 ) were used as precursors for NiO ALD. Oxygen plasma was used as a counter-reactant. The films were studied by spectroscopic ellipsometry, scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray reflectometry, and X-ray photoelectron spectroscopy. The results show that the optimal temperature for the deposition for NiCp 2 was 200-300 °C, but the optimal Ni(MeCp) 2 growth per ALD cycle was 0.011-0.012 nm for both precursors at 250-300 °C. The films deposited using NiCp 2 and oxygen plasma at 300 °C using optimal ALD condition consisted mainly of stoichiometric polycrystalline NiO with high density (6.6 g/cm 3 ) and low roughness (0.34 nm). However, the films contain carbon impurities. The NiO films (thickness 28-30 nm) deposited on stainless steel showed a specific capacity above 1300 mAh/g, which is significantly more than the theoretical capacity of bulk NiO (718 mAh/g) because it includes the capacity of the NiO film and the pseudo-capacity of the gel-like solid electrolyte interface film. The presence of pseudo-capacity and its increase during cycling is discussed based on a detailed analysis of cyclic voltammograms and charge-discharge curves (U(C)). © 2019 by the authors.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

20501 - Materials engineering

Project

—

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2019

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Coatings

ISSN

2079-6412

e-ISSN

—

Volume of the periodical

9

Issue of the periodical within the volume

5

Country of publishing house

CH - SWITZERLAND

Number of pages

16

Pages from-to

"301/1"-16

UT code for WoS article

000478810800022

EID of the result in the Scopus database

2-s2.0-85065760144