GRAPHENE PREPARATION BY CHEMICAL VAPOUR DEPOSITION METHOD AND ITS BASIC PARAMETERS
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F21%3A43923268" target="_blank" >RIV/60461373:22310/21:43923268 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
GRAPHENE PREPARATION BY CHEMICAL VAPOUR DEPOSITION METHOD AND ITS BASIC PARAMETERS
Original language description
The presented text describes the properties of graphene, its preparation by a number of methods with the focus on the classical Chemical Vapour Deposition Method (CVD) on copper foil together with graphene transfer onto a dielectric substrate. It presents the results published by the author in a number of cited publications. It is thus an overview work, which can serve as a study material for those, who are beginning to get acquainted with graphene, its properties and preparation by the CVD method, which is frequently used in practice.
Czech name
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Czech description
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Classification
Type
C - Chapter in a specialist book
CEP classification
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OECD FORD branch
20501 - Materials engineering
Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Book/collection name
Chemical Vapor Deposition (CVD)
ISBN
978-1-5361-9949-9
Number of pages of the result
31
Pages from-to
173-204
Number of pages of the book
204
Publisher name
Nova Science Publishers, Inc.
Place of publication
New York
UT code for WoS chapter
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