Direct Photopatterning of Green Solvent-Processed 2D Nanomaterials for Wafer-Scale Electronics

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F25%3A43932249" target="_blank" >RIV/60461373:22310/25:43932249 - isvavai.cz</a>

Result on the web

<a href="https://advanced.onlinelibrary.wiley.com/doi/pdf/10.1002/adma.202505917" target="_blank" >https://advanced.onlinelibrary.wiley.com/doi/pdf/10.1002/adma.202505917</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/adma.202505917" target="_blank" >10.1002/adma.202505917</a>

Result language

angličtina

Original language name

Direct Photopatterning of Green Solvent-Processed 2D Nanomaterials for Wafer-Scale Electronics

Original language description

Solution-processed 2D nanomaterials have emerged as key building blocks for the large-scale assembly of functional electronic devices. Solution processing enables the formation of electronically active percolated networks by leveraging van der Waals (vdW) interactions between individual 2D nanosheets. While effective vdW interactions are expected to minimize potential energy barriers and contact resistances between nanosheets, undesired residues from material synthesis or device fabrication processes may remain at the interface. In particular, the ideal solvent candidates for optimizing the stability of 2D dispersions are typically difficult to remove due to their high boiling points and exhibit environmental toxicity. Additionally, conventional patterning processes require multiple solvents, which can disrupt vdW interfaces and degrade device performance. To address these challenges, a comprehensive process that combines 2D dispersion preparation with a cross-linker-based direct photopatterning technique is developed using an eco-friendly green solvent. To enable this process, the stability of 2D nanomaterials and ultraviolet light-sensitive cross-linkers is thoroughly analyzed using Hansen solubility parameters. The developed process successfully enables the preparation of stable dispersions of cross-linkers and 2D nanomaterials, including graphene, molybdenum disulfide, tungsten diselenide, and hafnium disulfide, which can then be assembled via vdW interactions to create large-scale functional electronic devices.

Czech name

—

Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10405 - Electrochemistry (dry cells, batteries, fuel cells, corrosion metals, electrolysis)

Project

—

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2025

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

ADVANCED MATERIALS

ISSN

0935-9648

e-ISSN

1521-4095

Volume of the periodical

37

Issue of the periodical within the volume

40

Country of publishing house

DE - GERMANY

Number of pages

10

Pages from-to

nestránkováno

UT code for WoS article

001531650500001

EID of the result in the Scopus database

2-s2.0-105011254763