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Novel concepts for low-pressure, low-temperature nanodiamond growth using MW linear antenna plasma sources

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22340%2F10%3A00023577" target="_blank" >RIV/60461373:22340/10:00023577 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Novel concepts for low-pressure, low-temperature nanodiamond growth using MW linear antenna plasma sources

  • Original language description

    Industrial applications of PE MWCVD diamond grown on large area substrates, 3D shapes, at low substrate temperatures and on standard engineering substrate materials require novel plasma concepts. Based on the pioneering work of the group at AIST in Japan, high- density coaxial delivery type of plasmas have been explored [1]. However, an important challenge is to obtain commercially interesting growth rates at very low substrate temperatures. In the presented work we introduce the concept of novel linearantenna sources, designed at Leybold Optics Dresden, using high-frequency pulsed MW discharge. We present data on high plasma densities in this type of discharge (> 10 El 1 cm-3), accompanied by data from OES for CH4 - CO2 - H2 gas chemistry and the basic properties of the nano-crystalline diamond (NCD) films grown.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

  • Continuities

    S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2010

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Mater.Res.SocietySymp.Proceedings

  • ISSN

    0272-9172

  • e-ISSN

  • Volume of the periodical

    1203

  • Issue of the periodical within the volume

    1

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    6

  • Pages from-to

  • UT code for WoS article

  • EID of the result in the Scopus database