Novel concepts for low-pressure, low-temperature nanodiamond growth using MW linear antenna plasma sources
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F10%3A00342754" target="_blank" >RIV/68378271:_____/10:00342754 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Novel concepts for low-pressure, low-temperature nanodiamond growth using MW linear antenna plasma sources
Original language description
Industrial applications of PE MWCVD diamond grown on large area substrates, 3D shapes, at low substrate temperatures and on standard engineering substrate materials require novel plasma concepts. Based on the pioneering work of the group at AIST in Japan, highdensity coaxial delivery type of plasmas have been explored [1]. However, an important challenge is to obtain commercially interesting growth rates at very low substrate temperatures. In the presented work we introduce the concept of novel linear antenna sources, designed at Leybold Optics Dresden, using high-frequency pulsed MW discharge. We present data on high plasma densities in this type of discharge (> 10 E11 cm-3), accompanied by data from OES for CH4 ? CO2 - H2 gas chemistry and the basicproperties of the nano-crystalline diamond (NCD)films grown.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Diamond Electronics and Bioelectronics - Fundamentals to Applications III
ISBN
978-1-60511-176-6
ISSN
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e-ISSN
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Number of pages
6
Pages from-to
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Publisher name
Materials Research Society
Place of publication
Warrendale, PA
Event location
Boston
Event date
Nov 26, 2009
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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