Electrochemical Metal Deposition on Carbon Nanotubes.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F01%3A54020020" target="_blank" >RIV/61388955:_____/01:54020020 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Electrochemical Metal Deposition on Carbon Nanotubes.
Original language description
Preferential copper electrodeposition on multiwall carbon nanotubes immobilized on the electrode surface served as a model for metal deposition onto the carbon nanostructure. Mechanism of copper film formation is discussed. Potentiodynamic cycling to potential limits of water splitting was found to be suitable purification as well as impurity detection method for MWCNTs.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CG - Electrochemistry
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
New Diamond and Frontier Carbon Technology
ISSN
1344-9931
e-ISSN
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Volume of the periodical
11
Issue of the periodical within the volume
6
Country of publishing house
JP - JAPAN
Number of pages
9
Pages from-to
427-435
UT code for WoS article
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EID of the result in the Scopus database
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