Chemical vapor deposition (CVD) growth of graphene films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F14%3A00427982" target="_blank" >RIV/61388955:_____/14:00427982 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1533/9780857099334.1.27" target="_blank" >http://dx.doi.org/10.1533/9780857099334.1.27</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1533/9780857099334.1.27" target="_blank" >10.1533/9780857099334.1.27</a>
Alternative languages
Result language
angličtina
Original language name
Chemical vapor deposition (CVD) growth of graphene films
Original language description
The challenges and recent achievements in the chemical vapor deposition (CVD) production of graphene on nickel and copper substrates are reviewed. The formation of large-area monolayer domains, growth on single crystals and controlled formation of ordered multilayers are discussed in detail. Isotopic labeling is introduced as a tool to perform advanced studies on CVD graphene.
Czech name
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Czech description
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Classification
Type
C - Chapter in a specialist book
CEP classification
CF - Physical chemistry and theoretical chemistry
OECD FORD branch
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Result continuities
Project
<a href="/en/project/LL1301" target="_blank" >LL1301: From Graphene Hybrid Nanostructures to Green Electronics</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Book/collection name
Graphene. Properties, preparation, characterization and devices
ISBN
978-0-85709-508-4
Number of pages of the result
23
Pages from-to
27-49
Number of pages of the book
376
Publisher name
Woodhead Publishing
Place of publication
Cambridge
UT code for WoS chapter
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