Ion irradiation-induced localized stress relaxation in W thin film revealed by cross-sectional X-ray nanodiffraction
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F21%3A00541788" target="_blank" >RIV/61389005:_____/21:00541788 - isvavai.cz</a>
Alternative codes found
RIV/44555601:13440/21:43896199
Result on the web
<a href="https://doi.org/10.1016/j.tsf.2021.138571" target="_blank" >https://doi.org/10.1016/j.tsf.2021.138571</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.tsf.2021.138571" target="_blank" >10.1016/j.tsf.2021.138571</a>
Alternative languages
Result language
angličtina
Original language name
Ion irradiation-induced localized stress relaxation in W thin film revealed by cross-sectional X-ray nanodiffraction
Original language description
The influence of ion irradiation on residual stress and microstructure of thin films is not fully understood. Here, 5 MeV Si2+ ions were used to irradiate a 7 mu m thick tungsten film prepared by magnetron sputtering. Cross-sectional X-ray nanodiffraction and electron microscopy analyses revealed a depth-localized relaxation of inplane compressive residual stresses from -2.5 to - 0.75 GPa after the irradiation, which is correlated with the calculated displacements per atom within a similar to 2 mu m thick film region. The relaxation can be explained by the irradiation-induced removal of point defects from the crystal lattice, resulting in a reduction of strains of the 3rd order, manifested by a decrease of X-ray diffraction peak broadening, an increase of peak intensities and a decrease of lattice parameter. The results indicate that ion irradiation enables control over the residual stress state at distinct depths in the material.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
21001 - Nano-materials (production and properties)
Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Thin Solid Films
ISSN
0040-6090
e-ISSN
1879-2731
Volume of the periodical
722
Issue of the periodical within the volume
MAR
Country of publishing house
CH - SWITZERLAND
Number of pages
6
Pages from-to
138571
UT code for WoS article
000632481900003
EID of the result in the Scopus database
2-s2.0-85101013325