Stress-free deposition of [001] preferentially oriented titanium thin film by Kaufman ion-beam source

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F17%3APU124082" target="_blank" >RIV/00216305:26620/17:PU124082 - isvavai.cz</a>

Alternative codes found

RIV/00216224:14310/17:00099462

Result on the web

<a href="https://www.sciencedirect.com/science/article/pii/S0040609017305333" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0040609017305333</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2017.07.039" target="_blank" >10.1016/j.tsf.2017.07.039</a>

Result language

angličtina

Original language name

Stress-free deposition of [001] preferentially oriented titanium thin film by Kaufman ion-beam source

Original language description

We proposed a method to control and minimize residual stress in [001] preferentially oriented Ti thin films deposited by a Kaufman ion-beam source using a substrate temperature during deposition (T) as the parameter. We determined the residual stress, corresponding lattice parameters, and thickness of deposited films using x-ray diffraction and x-ray reflectivity measurements. We showed that the Ti film deposited at T ≈273 °C was stress-free with corresponding lattice parameters a0 and c0 of (2.954 ± 0.003) Å and (4.695 ± 0.001) Å, respectively. The stress-free sample has the superior crystallographic quality and pure [001] orientation. The Ti thin films were oriented with the c–axis parallel to the surface normal. We also investigated root mean square of surface roughness of deposited films by atomic force microscopy and it was in the range from ≈0.58 nm to ≈0.71 nm. Such smooth and stress-free layers are suitable for microelectromechanical systems.

Czech name

—

Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2017

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Volume of the periodical

638

Issue of the periodical within the volume

NA

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

6

Pages from-to

57-62

UT code for WoS article

000411775900008

EID of the result in the Scopus database

2-s2.0-85025133062