All

What are you looking for?

All
Projects
Results
Organizations

Quick search

  • Projects supported by TA ČR
  • Excellent projects
  • Projects with the highest public support
  • Current projects

Smart search

  • That is how I find a specific +word
  • That is how I leave the -word out of the results
  • “That is how I can find the whole phrase”

EUV nanosecond laser ablation of silicon carbide, tungsten and molybdenum

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F15%3A00452428" target="_blank" >RIV/61389021:_____/15:00452428 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    EUV nanosecond laser ablation of silicon carbide, tungsten and molybdenum

  • Original language description

    In this paper we present results of study interaction of nanosecond EUV laser pulses at wavelength of 46.9 nm with silicon carbide, tungsten and molybdenum. As a source of laser radiation was used discharge plasma driver CAPEX (CAPillary EXperiment) based on high current capillary discharge in argon. The laser beam is focused with a spherical Si/Sc multilayer coated mirror on samples. Experimental study has been performed with 1, 5, 10, 20 and 50 laser pulses ablation of silicon carbide, tungsten and molybdenum at various fluence values. Sample surface modification in the nanosecond time scale have been inspected optically.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2015

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Conference proceedings of 9th International Conference on Reactive Plasmas, 68th Gaseous Electronics Conference and 33rd Symposium on Plasma Processing

  • ISBN

    978-4-86348-529-7

  • ISSN

  • e-ISSN

  • Number of pages

    2

  • Pages from-to

    "GT1.00124"-"GT1.00124"

  • Publisher name

    Japan Society of Applied Physics

  • Place of publication

    Meieki, Nakamura-ku, Nagoya

  • Event location

    Honolulu, Hawaii

  • Event date

    Oct 12, 2015

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article