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Multi-energy ion implantation from high-intensity laser

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F16%3A00460803" target="_blank" >RIV/61389021:_____/16:00460803 - isvavai.cz</a>

  • Alternative codes found

    RIV/61389005:_____/16:00460803

  • Result on the web

    <a href="http://dx.doi.org/10.1515/nuka-2016-0019" target="_blank" >http://dx.doi.org/10.1515/nuka-2016-0019</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1515/nuka-2016-0019" target="_blank" >10.1515/nuka-2016-0019</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Multi-energy ion implantation from high-intensity laser

  • Original language description

    The laser-matter interaction using nominal laser intensity above 1015 W/cm(2) generates in vacuum non-equilibrium plasmas accelerating ions at energies from tens keV up to hundreds MeV. From thin targets, using the TNSA regime, plasma is generated in the forward direction accelerating ions above 1 MeV per charge state and inducing high-ionization states. Generally, the ion energies follow a Boltzmann-like distribution characterized by a cutoff at high energy and by a Coulomb-shift towards high energy increasing the ion charge state. The accelerated ions are emitted with the high directivity, depending on the ion charge state and ion mass, along the normal to the target surface. The ion fluencies depend on the ablated mass by laser, indeed it is low for thin targets. Ions accelerated from plasma can be implanted on different substrates such as Si crystals, glassy-carbon and polymers at different fluences. The ion dose increment of implanted substrates is obtainable with repetitive laser shots and with repetitive plasma emissions. Ion beam analytical methods (IBA), such as Rutherford backscattering spectroscopy (RBS), elastic recoil detection analysis (ERDA) and proton-induced X-ray emission (PIXE) can be employed to analyse the implanted species in the substrates. Such analyses represent `off-line' methods to extrapolate and to character the plasma ion stream emission as well as to investigate the chemical and physical modifications of the implanted surface. The multi-energy and species ion implantation from plasma, at high fluency, changes the physical and chemical properties of the implanted substrates, in fact, many parameters, such as morphology, hardness, optical and mechanical properties, wetting ability and nanostructure generation may be modified through the thermal-assisted implantation by multi-energy ions from laser-generated plasma.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2016

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Nukleonika

  • ISSN

    0029-5922

  • e-ISSN

  • Volume of the periodical

    61

  • Issue of the periodical within the volume

    2

  • Country of publishing house

    PL - POLAND

  • Number of pages

    5

  • Pages from-to

    109-113

  • UT code for WoS article

    000378086400005

  • EID of the result in the Scopus database

    2-s2.0-84976428159