Multi-energy ion implantation from high-intensity laser
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F16%3A00460803" target="_blank" >RIV/61389021:_____/16:00460803 - isvavai.cz</a>
Alternative codes found
RIV/61389005:_____/16:00460803
Result on the web
<a href="http://dx.doi.org/10.1515/nuka-2016-0019" target="_blank" >http://dx.doi.org/10.1515/nuka-2016-0019</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1515/nuka-2016-0019" target="_blank" >10.1515/nuka-2016-0019</a>
Alternative languages
Result language
angličtina
Original language name
Multi-energy ion implantation from high-intensity laser
Original language description
The laser-matter interaction using nominal laser intensity above 1015 W/cm(2) generates in vacuum non-equilibrium plasmas accelerating ions at energies from tens keV up to hundreds MeV. From thin targets, using the TNSA regime, plasma is generated in the forward direction accelerating ions above 1 MeV per charge state and inducing high-ionization states. Generally, the ion energies follow a Boltzmann-like distribution characterized by a cutoff at high energy and by a Coulomb-shift towards high energy increasing the ion charge state. The accelerated ions are emitted with the high directivity, depending on the ion charge state and ion mass, along the normal to the target surface. The ion fluencies depend on the ablated mass by laser, indeed it is low for thin targets. Ions accelerated from plasma can be implanted on different substrates such as Si crystals, glassy-carbon and polymers at different fluences. The ion dose increment of implanted substrates is obtainable with repetitive laser shots and with repetitive plasma emissions. Ion beam analytical methods (IBA), such as Rutherford backscattering spectroscopy (RBS), elastic recoil detection analysis (ERDA) and proton-induced X-ray emission (PIXE) can be employed to analyse the implanted species in the substrates. Such analyses represent `off-line' methods to extrapolate and to character the plasma ion stream emission as well as to investigate the chemical and physical modifications of the implanted surface. The multi-energy and species ion implantation from plasma, at high fluency, changes the physical and chemical properties of the implanted substrates, in fact, many parameters, such as morphology, hardness, optical and mechanical properties, wetting ability and nanostructure generation may be modified through the thermal-assisted implantation by multi-energy ions from laser-generated plasma.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Nukleonika
ISSN
0029-5922
e-ISSN
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Volume of the periodical
61
Issue of the periodical within the volume
2
Country of publishing house
PL - POLAND
Number of pages
5
Pages from-to
109-113
UT code for WoS article
000378086400005
EID of the result in the Scopus database
2-s2.0-84976428159