Optimization of exposure parameters for direct laser writing in optical lithography
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27360%2F22%3A10251805" target="_blank" >RIV/61989100:27360/22:10251805 - isvavai.cz</a>
Alternative codes found
RIV/61989100:27740/22:10251805 RIV/61989100:27640/22:10251805
Result on the web
<a href="https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12502/2664190/Optimization-of-exposure-parameters-for-direct-laser-writing-in-optical/10.1117/12.2664190.short?SSO=1" target="_blank" >https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12502/2664190/Optimization-of-exposure-parameters-for-direct-laser-writing-in-optical/10.1117/12.2664190.short?SSO=1</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1117/12.2664190" target="_blank" >10.1117/12.2664190</a>
Alternative languages
Result language
angličtina
Original language name
Optimization of exposure parameters for direct laser writing in optical lithography
Original language description
Various types of nano- and micro-structures, such as security holograms and diffractive optical elements, can be prepared directly into a photoresist using a direct-write optical lithography. Precise knowledge of photoresist properties, parameters of exposure, and photoresist development time are essential. We have characterized and optimised exposure of the positive binary sensitive photoresist ma-P 1200 series. Complex optical functions ware obtained using Mueller matrix spectroscopic ellipsometry. True thickness profile of linearly exposed photoresist was studied by confocal microscopy and strong non-linearity was observed. In this paper we propose exposure correction to compensate this non-linearity. (C) 2022 SPIE.
Czech name
—
Czech description
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Classification
Type
D - Article in proceedings
CEP classification
—
OECD FORD branch
10300 - Physical sciences
Result continuities
Project
—
Continuities
V - Vyzkumna aktivita podporovana z jinych verejnych zdroju
Others
Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of SPIE - The International Society for Optical Engineering. Volume 12502
ISBN
978-1-5106-6111-0
ISSN
0277-786X
e-ISSN
1996-756X
Number of pages
5
Pages from-to
—
Publisher name
SPIE - The International Society for Optical Engineering
Place of publication
Bellingham
Event location
Wojanów
Event date
Sep 6, 2022
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000920988700021