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Diffractive order Mueller matrix ellipsometry for the design and manufacture of polarization beam splitting metasurfaces

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27360%2F24%3A10253526" target="_blank" >RIV/61989100:27360/24:10253526 - isvavai.cz</a>

  • Alternative codes found

    RIV/61989100:27640/24:10253526 RIV/61989100:27740/24:10253526

  • Result on the web

    <a href="https://opg.optica.org/oe/fulltext.cfm?uri=oe-32-1-703&id=544777" target="_blank" >https://opg.optica.org/oe/fulltext.cfm?uri=oe-32-1-703&id=544777</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1364/OE.501709" target="_blank" >10.1364/OE.501709</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Diffractive order Mueller matrix ellipsometry for the design and manufacture of polarization beam splitting metasurfaces

  • Original language description

    Optical metasurface technology promises an important potential for replacing bulkytraditional optical components, in addition to enabling new compact and lightweight metasurfacebased devices. Since even subtle imperfections in metasurface design or manufacture stronglyaffect their performance, there is an urgent need to develop proper and accurate protocols for theircharacterization, allowing for efficient control of the fabrication. We present non-destructivespectroscopic Mueller matrix ellipsometry in an uncommon off-specular configuration as apowerful tool for the characterization of orthogonal polarization beam-splitters based on a-Si:Hnanopillars. Through Mueller matrix analysis, the spectroscopic polarimetric performance ofthe +-1 diffraction orders is experimentally demonstrated. This reveals a wavelength shift inthe maximum efficiency caused by fabrication-induced conical pillars while still maintaininga polarimetric response close to ideal non-depolarizing Mueller matrices. We highlight theadvantage of the spectroscopic Mueller matrix approach, which not only allows for monitoringand control of the fabrication process itself, but also verifies the initial design and producesfeedback into the computational design.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10300 - Physical sciences

Result continuities

  • Project

    <a href="/en/project/EF16_013%2F0001791" target="_blank" >EF16_013/0001791: IT4Innovations national supercomputing center - path to exascale</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2024

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Optics Express

  • ISSN

    1094-4087

  • e-ISSN

  • Volume of the periodical

    32

  • Issue of the periodical within the volume

    1

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    19

  • Pages from-to

    703-721

  • UT code for WoS article

    001171156400001

  • EID of the result in the Scopus database

    2-s2.0-85181401567