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Nitrogen cluster doping for high-mobility/conductivity graphene films with millimeter-sized domains

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27710%2F19%3A10242593" target="_blank" >RIV/61989100:27710/19:10242593 - isvavai.cz</a>

  • Result on the web

    <a href="https://advances.sciencemag.org/content/5/8/eaaw8337" target="_blank" >https://advances.sciencemag.org/content/5/8/eaaw8337</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1126/sciadv.aaw8337" target="_blank" >10.1126/sciadv.aaw8337</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Nitrogen cluster doping for high-mobility/conductivity graphene films with millimeter-sized domains

  • Original language description

    Directly incorporating heteroatoms into the hexagonal lattice of graphene during growth has been widely used to tune its electrical properties with superior doping stability, uniformity, and scalability. However the introduction of scattering centers limits this technique because of reduced carrier mobilities and conductivities of the resulting material. Here, we demonstrate a rapid growth of graphitic nitrogen cluster-doped monolayer graphene single crystals on Cu foil with remarkable carrier mobility of 13,000 cm(2) V-1 s(-1) and a greatly reduced sheet resistance of only 130 ohms square(-1). The exceedingly large carrier mobility with high n-doping level was realized by (i) incorporation of nitrogen-terminated carbon clusters to suppress the carrier scattering and (ii) elimination of all defective pyridinic nitrogen centers by oxygen etching. Our study opens up an avenue for the growth of high-mobility/conductivity doped graphene with tunable work functions for scalable graphene-based electronic and device applications.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    20400 - Chemical engineering

Result continuities

  • Project

    <a href="/en/project/EF16_019%2F0000853" target="_blank" >EF16_019/0000853: Institute of Environmental Technology - Excellent Research</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2019

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Science Advances

  • ISSN

    2375-2548

  • e-ISSN

  • Volume of the periodical

    5

  • Issue of the periodical within the volume

    8

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    9

  • Pages from-to

    1-9

  • UT code for WoS article

    000481798400039

  • EID of the result in the Scopus database