TEA CO2 Pulsed Laser Deposition of Silicon Suboxide Films.

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985858%3A_____%2F01%3A27013035" target="_blank" >RIV/67985858:_____/01:27013035 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

TEA CO2 Pulsed Laser Deposition of Silicon Suboxide Films.

Original language description

The growth of silicon suboxide films (SiOx, x < 2) by pulsed TEA CO2 laser ablation of SiO target at low substrate temperatures (less than or equal to 425 degreesC) in vacuum is reported. To understand the wavenumber shift of the asymmetric stretching band v(Si-O) with temperature the subbands obtained by fitting of infrared spectra using X-ray photoelectron data were located and studied. The structural properties of deposited films were investigated. Since relative concentration of oxygen is almost constant and relative concentration of elemental silicon and SiO2 in the films increases with the substrate temperature the shift of asymmetric stretching band v(Si-O) can be explained by rearrangement and relaxation processes in the films and/or by movingof oxygen atoms from Si2O, SiO and Si2O3 to Si and SiO2 silicon species creating the films.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

CH - Nuclear and quantum chemistry, photo chemistry

OECD FORD branch

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Project

<a href="/en/project/GA203%2F00%2F1288" target="_blank" >GA203/00/1288: Laser ablation and chemistry of silicon monoxide</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2001

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Non-Crystalline Solids

ISSN

0022-3093

e-ISSN

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Volume of the periodical

288

Issue of the periodical within the volume

1-3

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

6

Pages from-to

30-36

UT code for WoS article

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EID of the result in the Scopus database

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