IR Laser-Induced Process for Chemical Vapor Deposition of Polyselenocarbosilane Films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985858%3A_____%2F06%3A00049444" target="_blank" >RIV/67985858:_____/06:00049444 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
IR Laser-Induced Process for Chemical Vapor Deposition of Polyselenocarbosilane Films
Original language description
TEA CO2 laser irradiation into gaseous mixtures of 1,3-disilacyclobutane and dimethyl selenide results in infrared multiple photon-induced, non-interacting homogeneous decompositions of both educts, one yielding silene (H2Si=CH2) and the other elementalselenium as major products. The reaction between polymerizing silene and agglomerizing Se leads to chemical vapor deposition of novel polyselenocarbosilane films which are unstable in atmosphere. The laser induced co-decomposition represents a new process in allowing (i) reaction between thermally generated transient and element (ii) and chemical vapor deposition of the product of this reaction.
Czech name
IČ laserově iniciovaný proces pro chemickou deposici polyselenokarbosilanových filmů z plynné fáze
Czech description
TEA CO2 laserové ozařování plynných směsí 1,3-disilacyclobutanu a dimethyl selenidu vede k IČ mnohofotonovým neinteragujícím rozkladům obou eduktů, tedy k tvorbě silenu (H2Si=CH2) a elementárního selenu. Reakce mezi oběma intermediáty produkuje nové polyselenokarbosilanové filmy, které jsou nestálé vůči atmosféře. Tento laserově iniciovaný ko-rozklad představuje nový proces dovolující reakci mezi inetrmediátem a prvkem a umožňuje chemickou deposici produktu této reakce z plynné fáze.
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CH - Nuclear and quantum chemistry, photo chemistry
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ME%20684" target="_blank" >ME 684: By laser and Cl atom iniciated deposition of new polykarbosilazan from gas phase.</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2006
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Analytical and Applied Pyrolysis
ISSN
0165-2370
e-ISSN
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Volume of the periodical
76
Issue of the periodical within the volume
1-2
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
8
Pages from-to
178-185
UT code for WoS article
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EID of the result in the Scopus database
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