Characterization of thin MnSi and MnGe Layers Prepared by Reactive UV Pulsed Laser Deposition.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985858%3A_____%2F16%3A00465309" target="_blank" >RIV/67985858:_____/16:00465309 - isvavai.cz</a>
Alternative codes found
RIV/68407700:21340/16:00309402
Result on the web
<a href="http://dx.doi.org/10.1016/j.tsf.2016.10.035" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2016.10.035</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.tsf.2016.10.035" target="_blank" >10.1016/j.tsf.2016.10.035</a>
Alternative languages
Result language
angličtina
Original language name
Characterization of thin MnSi and MnGe Layers Prepared by Reactive UV Pulsed Laser Deposition.
Original language description
Reactive pulsed laser deposition is a technique suitable for producing homogenous thin layers of silicon or germanium with high concentration of embedded manganese atoms. Linear calibration of EDS (Energy Dispersive X-ray Spectroscopy) was utilized for an elemental analysis of thin layers. MnSi and MnGe (manganese-silicon and manganese-germanium) layers containing non-oxidized Mn were obtained for Mn molar concentration in the range from 15 to 50%. Electron diffraction showed an amorphous character of MnSi layers. MnGe layers contained two different types of nanoparticles incorporated inside an amorphous matrix. The layers were semiconducting with resistivities from 103 to 105 Ωm.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CF - Physical chemistry and theoretical chemistry
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GC15-08842J" target="_blank" >GC15-08842J: “Silicene on copper”: monoatomic silicon surface layer with silicene-like arrangement on Cu(3+x)Si prepared by chemical and mechanical exfoliation</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Thin Solid Films
ISSN
0040-6090
e-ISSN
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Volume of the periodical
619
Issue of the periodical within the volume
NOV 30
Country of publishing house
CH - SWITZERLAND
Number of pages
8
Pages from-to
73-80
UT code for WoS article
000389610900011
EID of the result in the Scopus database
2-s2.0-84993326648