Single-shot selective femtosecond and picosecond infrared laser crystallization of an amorphous Ge/Si multilayer stack
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00571614" target="_blank" >RIV/68378271:_____/23:00571614 - isvavai.cz</a>
Alternative codes found
RIV/68407700:21340/23:00367013
Result on the web
<a href="https://doi.org/10.1016/j.optlastec.2023.109161" target="_blank" >https://doi.org/10.1016/j.optlastec.2023.109161</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.optlastec.2023.109161" target="_blank" >10.1016/j.optlastec.2023.109161</a>
Alternative languages
Result language
angličtina
Original language name
Single-shot selective femtosecond and picosecond infrared laser crystallization of an amorphous Ge/Si multilayer stack
Original language description
Pulsed laser crystallization is an efficient annealing technique to obtain polycrystalline silicon or germanium films on non-refractory substrates. This is important for creating “flexible electronics” and can also be used to fabricate thin-film solar cells. In this work, near- and mid-infrared femtosecond and picosecond laser pulses were used to crystallize a Ge/Si multilayer stack consisting of alternating amorphous thin films of silicon and germanium. The use of infrared radiation at wavelengths of 1030 and 1500 nm with photon energies lower than the optical absorption edge in amorphous silicon allowed obtaining selective crystallization of germanium layers with a single laser shot. The phase composition of the irradiated stack was investigated by the Raman scattering technique. Several non-ablative regimes of ultrashort-pulse laser crystallization were found, from partial crystallization of germanium without intermixing the Ge/Si layers to complete intermixing of the layers with formation of GexSi1-x solid alloys. The roles of single- and two-photon absorption, thermal and non-thermal (ultrafast) melting processes, and laser-induced stresses in selective pico- and femtosecond laser annealing are discussed. It is concluded that, due to a mismatch of the thermal expansion coefficients between the adjacent stack layers, efficient explosive solid-phase crystallization of the Ge layers is possible at relatively low temper atures, well below the melting point.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10306 - Optics (including laser optics and quantum optics)
Result continuities
Project
<a href="/en/project/EF15_003%2F0000445" target="_blank" >EF15_003/0000445: Advanced designing of functional materials: From mono- to BI- And TRI-chromatic excitation with tailored laser pulses</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Optics and Laser Technology
ISSN
0030-3992
e-ISSN
1879-2545
Volume of the periodical
161
Issue of the periodical within the volume
June
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
10
Pages from-to
109161
UT code for WoS article
000960852700001
EID of the result in the Scopus database
2-s2.0-85146431519