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Single-shot selective femtosecond and picosecond infrared laser crystallization of an amorphous Ge/Si multilayer stack

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00571614" target="_blank" >RIV/68378271:_____/23:00571614 - isvavai.cz</a>

  • Alternative codes found

    RIV/68407700:21340/23:00367013

  • Result on the web

    <a href="https://doi.org/10.1016/j.optlastec.2023.109161" target="_blank" >https://doi.org/10.1016/j.optlastec.2023.109161</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.optlastec.2023.109161" target="_blank" >10.1016/j.optlastec.2023.109161</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Single-shot selective femtosecond and picosecond infrared laser crystallization of an amorphous Ge/Si multilayer stack

  • Original language description

    Pulsed laser crystallization is an efficient annealing technique to obtain polycrystalline silicon or germanium films on non-refractory substrates. This is important for creating “flexible electronics” and can also be used to fabricate thin-film solar cells. In this work, near- and mid-infrared femtosecond and picosecond laser pulses were used to crystallize a Ge/Si multilayer stack consisting of alternating amorphous thin films of silicon and germanium. The use of infrared radiation at wavelengths of 1030 and 1500 nm with photon energies lower than the optical absorption edge in amorphous silicon allowed obtaining selective crystallization of germanium layers with a single laser shot. The phase composition of the irradiated stack was investigated by the Raman scattering technique. Several non-ablative regimes of ultrashort-pulse laser crystallization were found, from partial crystallization of germanium without intermixing the Ge/Si layers to complete intermixing of the layers with formation of GexSi1-x solid alloys. The roles of single- and two-photon absorption, thermal and non-thermal (ultrafast) melting processes, and laser-induced stresses in selective pico- and femtosecond laser annealing are discussed. It is concluded that, due to a mismatch of the thermal expansion coefficients between the adjacent stack layers, efficient explosive solid-phase crystallization of the Ge layers is possible at relatively low temper atures, well below the melting point.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10306 - Optics (including laser optics and quantum optics)

Result continuities

  • Project

    <a href="/en/project/EF15_003%2F0000445" target="_blank" >EF15_003/0000445: Advanced designing of functional materials: From mono- to BI- And TRI-chromatic excitation with tailored laser pulses</a><br>

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2023

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Optics and Laser Technology

  • ISSN

    0030-3992

  • e-ISSN

    1879-2545

  • Volume of the periodical

    161

  • Issue of the periodical within the volume

    June

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    10

  • Pages from-to

    109161

  • UT code for WoS article

    000960852700001

  • EID of the result in the Scopus database

    2-s2.0-85146431519