Selective ultrashort laser annealing of amorphous Ge/Si multilayer stacks
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00569418" target="_blank" >RIV/68378271:_____/22:00569418 - isvavai.cz</a>
Result on the web
<a href="https://www.epj-conferences.org/articles/epjconf/pdf/2022/10/epjconf_eosam2022_06012.pdf" target="_blank" >https://www.epj-conferences.org/articles/epjconf/pdf/2022/10/epjconf_eosam2022_06012.pdf</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1051/epjconf/202226606012" target="_blank" >10.1051/epjconf/202226606012</a>
Alternative languages
Result language
angličtina
Original language name
Selective ultrashort laser annealing of amorphous Ge/Si multilayer stacks
Original language description
Single-short las. crystalliz. of Ge/Si multilayer stacks consisting of alternating amorphous nanosized films of silicon and germanium using near- and mid-infrared femtosec. and picosec. las. pulses.The phase composition of the irradiated stacks was investigated by the Raman scattering technique.Several non-ablative regimes of crystalliz. were found,from partial crystalliz. of germanium without intermixing the Ge/Si layers to complete intermixing of the layers with formation of GexSi1-x solid alloys.The roles of one- and two-photon absorption,thermal and non-thermal melting processes,and laser-induced stresses in selective pico- and femtosecond laser annealing are analysed based on theoretical estimations and comparison with experimental data.It is concluded that,due to a mismatch of the thermal expansion coefficients between the adjacent stack layers,efficient explosive solid-phase crystallization of the Ge layers is possible at relatively low temperatures,well below the melting point.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
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OECD FORD branch
10306 - Optics (including laser optics and quantum optics)
Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
EPJ Web of Conferences
ISBN
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ISSN
2100-014X
e-ISSN
2100-014X
Number of pages
2
Pages from-to
06012
Publisher name
EDP Science
Place of publication
Les Ulis
Event location
Porto
Event date
Sep 12, 2022
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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