Application of pressurized hot water for etching of microfluidics

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081715%3A_____%2F13%3A00437327" target="_blank" >RIV/68081715:_____/13:00437327 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Application of pressurized hot water for etching of microfluidics

Original language description

The subject of this study is a new method of glass etching and its application in microfluidics. Commonly, hydrofluoric acid is used for glass etching. In this study we have tested a new method of glass etching using pressurized hot water. Test motives were prepared using photolitography and metal sputtering on the glass substrate and the etching was performed in a newly developed device capable to compress and heat water to its critical point. Electron microscopy and profilometry have been used for analyzing the surface of the etched glass substrate.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

CB - Analytical chemistry, separation

OECD FORD branch

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Project

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Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2013

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Chemické Listy. Roč. 107, Issue s3.

ISBN

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ISSN

1213-7103

e-ISSN

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Number of pages

2

Pages from-to

333-334

Publisher name

Česká společnost chemická

Place of publication

Praha

Event location

Brno

Event date

Nov 12, 2013

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

000328730800021