Fabrication of Multilevel Diffractive Optical Elements using Electron Beam Lithography.

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F03%3A12030015" target="_blank" >RIV/68081731:_____/03:12030015 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—

Result language
angličtina
Original language name
Fabrication of Multilevel Diffractive Optical Elements using Electron Beam Lithography.
Original language description
This paper presents the results of a research concerning the fabrication of binary and multi-level phase-only diffractive optical elements (PDOE) using the technology of electron beam lithography. The electron beam lithography technology was used directly for modification of the reliefs of thin layers of PMMA resist such that the relief structure created in PMMA be optically functional for the given phase-only optical element. The paper inc ludes discussion of the issues pertaining to the capabilities of electron beam lithography to create defined 3D relief structures in thin layers of PMMA resist.
Czech name
—
Czech description
—

Project
<a href="/en/project/IBS2065014" target="_blank" >IBS2065014: Submicrometer relief diffractive structures made by electron-beam lithography.</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of the 9th International Workshop on Applied Physics of Condensed Matter.
ISBN
80-8070-088-5
ISSN
—
e-ISSN
—
Number of pages
4
Pages from-to
241-244
Publisher name
FEE University of Žilina
Place of publication
Žilina
Event location
Malá Lučivá [SK]
Event date
Jun 11, 2003
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
—

Similar results(10)