Conjugated Silicon?Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F10%3A00341918" target="_blank" >RIV/68081731:_____/10:00341918 - isvavai.cz</a>

Alternative codes found

RIV/70883521:28140/10:63509541

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Conjugated Silicon?Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes

Original language description

The comparison of the susceptibility of aryl-substituted polysilanes to the photodegradation by electron beam (EB) and UV radiation is examined on the prototypical material, poly[methyl(phenyl)silylene] (PMPSi). The main purpose of this paper is to compare the photoluminescence (PL) and cathodoluminescence (CL) after major degradation, predominantly in the long wavelength range of 400?600 nm, studying the disorder due to dangling bonds, conformational transformations and weak bonds created by the degradation process. The UV degradation was a completely reversible process, whereas the EB degradation process was only reversible, provided certain material specific level of degradation was not exceeded. This observation supports different paths and final states in both UV and EB degradations. The results serve for the optimization of polysilane nanoresists.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

JA - Electronics and optoelectronics

OECD FORD branch

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Project

<a href="/en/project/IAA100100622" target="_blank" >IAA100100622: CONJUGATED SILICON ? BASED POLYMER RESISTS FOR NANOTECHNOLOGIES</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2010

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Materials Transactions

ISSN

1345-9678

e-ISSN

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Volume of the periodical

51

Issue of the periodical within the volume

2

Country of publishing house

JP - JAPAN

Number of pages

5

Pages from-to

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UT code for WoS article

000276538900001

EID of the result in the Scopus database

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