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Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F14%3A00437838" target="_blank" >RIV/68081731:_____/14:00437838 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam

  • Original language description

    One of the main goals in e-beam lithography is to increase exposure speed to achieve higher throughput. There are basically two types of electron-beam writers, shaped beam lithography systems and Gaussian beam lithography systems. The exposure time of both e-beam writers consist in essence of beam-on time, deflection system stabilization time and stage movement time. Exposure time testing was carried out on two types of patterns. There were completely filled in areas, binary period gratings (ratio 1:1 between exposed and unexposed areas), and multileveled structures (computer generated holograms). Exposures data was prepared according to standard technology (PMMA resist, exposure dose, non-alcoholic based developer) for both systems. The result of experiment shows that variable shaped beam system has advantage in multileveled structures while the Gaussian beam system is more suitable for gratings type of pattern. It was proved that combination of both systems has its use to increase ex

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    JA - Electronics and optoelectronics

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2014

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    NANOCON 2014. 6th International conference proceedings

  • ISBN

    978-80-87294-55-0

  • ISSN

  • e-ISSN

  • Number of pages

    5

  • Pages from-to

  • Publisher name

    TANGER

  • Place of publication

    Ostrava

  • Event location

    Brno

  • Event date

    Nov 5, 2014

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article