PEC Reliability in 3D E-beam DOE Nanopatterning

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F15%3A00451587" target="_blank" >RIV/68081731:_____/15:00451587 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1017/S1431927615013422" target="_blank" >http://dx.doi.org/10.1017/S1431927615013422</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1017/S1431927615013422" target="_blank" >10.1017/S1431927615013422</a>

Result language

angličtina

Original language name

PEC Reliability in 3D E-beam DOE Nanopatterning

Original language description

Diffractive optical elements (DOE) such as computer generated holograms (CGH) and blazed gratings are commonly used in coherent optics (beam splitters, beam shapers, diffusers)and security features. High quality preparation of these structures is necessary to obtain designed properties. Electron beam lithography (EBL) is one of method which allows creating fine structures in high resolution. The most undesired influence during the preparation of structures by EBL is proximity effect causing the adjacentregions to exposed one will receive non-zero dose. This effect is described by point spread function (PSF) which represents the absorbed energy distribution in radial distance from the point of incidence after point exposure. These PSF are usually obtained by Monte Carlo simulation in different programs (using various MC models). If the PSF function is known it can be used for proximity effect correction (PEC). Approximation of PSF can be done and then the key parameters (?, ?, ?) can b

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

JA - Electronics and optoelectronics

OECD FORD branch

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Project

<a href="/en/project/LO1212" target="_blank" >LO1212: ALISI - Centre of advanced diagnostic methods and technologies</a><br>

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Microscopy and Microanalysis

ISSN

1431-9276

e-ISSN

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Volume of the periodical

21

Issue of the periodical within the volume

S4

Country of publishing house

US - UNITED STATES

Number of pages

6

Pages from-to

230-235

UT code for WoS article

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EID of the result in the Scopus database

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