Influence of nuclation parameters on growth of diamond thin films by hybrid hot filament CVD.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F03%3A02030320" target="_blank" >RIV/68378271:_____/03:02030320 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Influence of nuclation parameters on growth of diamond thin films by hybrid hot filament CVD.
Original language description
Diamond thin films have been deposited using a modified hot filament CVD method involving a dual-plasma reactor arrangement. This new design allows ignition of d.c. plasma above and/or below hot filaments. Thus, substrate bombardement by ions could be realized in the reverse biasing at as low voltages as 50V.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Diamond and Related Materials
ISSN
0925-9635
e-ISSN
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Volume of the periodical
12
Issue of the periodical within the volume
N/A
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
5
Pages from-to
356-360
UT code for WoS article
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EID of the result in the Scopus database
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