Investigation of diamond growth at high pressure by microwave plasma chemical vapor deposition

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F04%3A00100473" target="_blank" >RIV/68378271:_____/04:00100473 - isvavai.cz</a>

Alternative codes found

RIV/68407700:21340/04:04105366

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Investigation of diamond growth at high pressure by microwave plasma chemical vapor deposition

Original language description

Polycrystalline diamond thin films were grown on 2-inch silicon wafers at high pressures, up to 250 mbar, in high power microwave plasma CVD rotational ellipsoidal reactor.Influence of the gas pressure and the gas mixture on the diamond growth was investigated. High rates, up to 4.5 ?m/h were obtained at high pressure and low methane concentration

Czech name

Studium růstu diamantu metodou MW CVD z plynné fáze při vysokém tlaku

Czech description

Polykryskalické diamantové tenké vrstvy byli vypěstovány na křemíkových podložkách o průměru 2 palce při tlaku do 250 mbar v rotačním eliptickém reaktoru metodou MW CVD. Byl studován vliv tlaku plynu a složení plynu na růst diamantu. Bylo dosaženo vysokérychlosti růstu 4.5 microm/h při vysokém tlaku a nízké koncentraci metanu

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2004

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Diamond and Related Materials

ISSN

0925-9635

e-ISSN

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Volume of the periodical

13

Issue of the periodical within the volume

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Country of publishing house

CH - SWITZERLAND

Number of pages

6

Pages from-to

604-609

UT code for WoS article

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EID of the result in the Scopus database

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