Linear antenna microwave plasma CVD deposition of diamond films over large areas

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F12%3A00377789" target="_blank" >RIV/68378271:_____/12:00377789 - isvavai.cz</a>

Alternative codes found

RIV/68407700:21340/12:00200426

Result on the web

<a href="http://dx.doi.org/10.1016/j.vacuum.2011.07.008" target="_blank" >http://dx.doi.org/10.1016/j.vacuum.2011.07.008</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2011.07.008" target="_blank" >10.1016/j.vacuum.2011.07.008</a>

Result language

angličtina

Original language name

Linear antenna microwave plasma CVD deposition of diamond films over large areas

Original language description

Diamond thin films were grown by linear antenna microwave plasma CVD process over large areas (up to 20 10 cm2) from a hydrogen based gas mixture. The influence of the gas coDmposition (H2, CH4, CO2) and total gas pressure (0.1 and 2 mbar) on the film growth is presented. For CH4/H2 gas mixtures, the surface crystal size does not show dependence on the methane concentration and total pressure and remains below 50 nm as observed by SEM. Adding CO2 (up to 10%) significantly improves the growth rate. However, still no significant change of morphology is observed on films grown at 2 mbar. The crucial improvement of the diamond film purity (as detected by Raman spectroscopy) and crystal size is found for deposition at 0.1 mbar. In this case, crystals are aslarge as 500 nm and the growth rate increases up to 38 nm/h.

Czech name

—

Czech description

—

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

—

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2012

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Vacuum

ISSN

0042-207X

e-ISSN

—

Volume of the periodical

86

Issue of the periodical within the volume

6

Country of publishing house

GB - UNITED KINGDOM

Number of pages

4

Pages from-to

776-779

UT code for WoS article

000301018400048

EID of the result in the Scopus database

—