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Short-wavelength ablation of molecular solids: pulse duration and wavelength effects

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F05%3A00025580" target="_blank" >RIV/68378271:_____/05:00025580 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Short-wavelength ablation of molecular solids: pulse duration and wavelength effects

  • Original language description

    Comparing the values of etch rates calculated for nanosecond pulses with those measured for shorter pulses, we can study the influence of pulse duration on XUV ablation efficiency. The results of the experiments also show that the ablation rate increaseswhile the wavelength decreases from the XUV spectral region toward X-rays, mainly due to increase of attenuation lengths at short wavelengths

  • Czech name

    Krátkovlnná ablace molekulárních pevných látek: vlivy vlnové délky a trvání impulzu

  • Czech description

    Když porovnáme vypočtené účinnosti ablace nanosekundovými impulzy s těmi změřenými s femtosekundové impulzy můžeme posoudit vliv délky impulzu na účinnost krátkovlnné ablace. Naše experimentální výsledky dále ukazují, že s poklesem vlnavé délky od XUV dortg spektrálního oboru ablační účinnost roste s rostoucí atenuační délkou

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BH - Optics, masers and lasers

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2005

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Journal of Microlithography Microfabrication and Microsystems

  • ISSN

    1537-1646

  • e-ISSN

  • Volume of the periodical

    4

  • Issue of the periodical within the volume

    3

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    11

  • Pages from-to

    "033007/1"-"033007/11"

  • UT code for WoS article

  • EID of the result in the Scopus database