Comparing ablation induced by fs, ps, and ns XUV-laser pulses

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F04%3A00101817" target="_blank" >RIV/68378271:_____/04:00101817 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Comparing ablation induced by fs, ps, and ns XUV-laser pulses
Original language description
Various short-wavelength (lambda<100 nm) lasers emitted pulses with durations ranging from :10 fs to : 1 ns have recently been used to material ablation.Etch rates for three different pulse durations are comparing using the XUV-ABLATOR code to compensatefor the wavelength difference and to study the influence of pulse duration on the XUV ablation efficieny
Czech name
Srovnani ablace indukovane femto-, piko- a nanosekundovymi impulzy XUV laserů
Czech description
K materialove ablaci byly pouzity ruzne kratkovlnne (lambda<100 nm) lasery s impulzy o delkach od 10 fs do 1 ns. Ablacni rychlosti pro tri ruzne delky impulzu byly porovnany neprimo, s pomoci numerickeho kodu XUV-ABLATOR. Byl tak vyloucen vliv rozdilnosti vlnovych delek zminenych laseru, coz umoznilo posoudit vliv delky laseroveho impulzu na ucinnost XUV ablace

Project
<a href="/en/project/1P04LA235" target="_blank" >1P04LA235: Research in frame of the International Center for Dense Magnetized Plasma</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2004
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings SPIE - The International Society for Optical Engineering
ISBN
0-8194-5371-4
ISSN
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e-ISSN
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Number of pages
10
Pages from-to
827-836
Publisher name
SPIE
Place of publication
Bellingham
Event location
Taos, New Mexico
Event date
Apr 25, 2004
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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