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Optical and structural properties of Pr:GGGcrystalline thin film waveguides grown by pulsed-laser deposition

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F05%3A00025707" target="_blank" >RIV/68378271:_____/05:00025707 - isvavai.cz</a>

  • Alternative codes found

    RIV/68407700:21460/05:00113073

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Optical and structural properties of Pr:GGGcrystalline thin film waveguides grown by pulsed-laser deposition

  • Original language description

    Crystalline Pr3+ doped Gd3Ga5O12 (Pr:GGG) thin films were grown by pulsed laser deposition (PLD) on yttrium aluminium garnet (YAG) substrates. A strong influence of the oxgen pressure on the gallium content in the films as well as in the target surface was found. Well crystallised and stoichiometric GGG films were fabricated at 800 oC in the 5 to 10 Pa oxygen pressure range

  • Czech name

    Optické a strukturní vlastnosti tenkých krystalických vlnovodných vrstev Pr:GGG připravených pulsní laserovou depozici

  • Czech description

    Krystalické tenké vrstvy Gd3Ga5O12 dopované Pr3+ byly připraveny pulsní laserovou deposicí na podložky YAG. Byl prokázán silný vliv tlaku kyslíku na obsah galis ve vrystvě stejně jako v povrchu terče. Dobře krystalizované a stechiometrické GGG vrystvy byly připraveny při teplotě 800 oC a tlaku v rozmezí 5-10 Pa

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GP106%2F01%2FD017" target="_blank" >GP106/01/D017: Study of combined PLD with r.f. discharges for improvement of optic layers properties</a><br>

  • Continuities

    Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2005

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Applied Physics A - Materials Science & Processing

  • ISSN

    0947-8396

  • e-ISSN

  • Volume of the periodical

    81

  • Issue of the periodical within the volume

    -

  • Country of publishing house

    DE - GERMANY

  • Number of pages

    7

  • Pages from-to

    1477-1483

  • UT code for WoS article

  • EID of the result in the Scopus database