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Titania seed layers for PZT thin film growth on copper-coated Kapton films

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F09%3A00336552" target="_blank" >RIV/68378271:_____/09:00336552 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Titania seed layers for PZT thin film growth on copper-coated Kapton films

  • Original language description

    n this work, we investigate the deposition of crystallization-promoting amorphous titania seed layers onto Cu-coated Kapton (R) HN foils for a subsequent PZT thin film fabrication thereon. Ultrathin TiO2-x layers with controlled stoichiometry were deposited by reactive sputtering at low substrate temperatures. X-ray photoelectron spectroscopy revealed that the Ti4+ ion in the seed layer was stable against Ar+ bombardment-induced reduction while CuO was reduced to Cu2O. Adsorbed moisture, organic solvents and carbon contaminations were quickly removed by Ar+ ion bombardment. (111)-textured PZT was fabricated on seed-layer-coated flexible substrates by means of a RF-modulated plasma jet system.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2009

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Integrated Ferroelectrics

  • ISSN

    1058-4587

  • e-ISSN

  • Volume of the periodical

    108

  • Issue of the periodical within the volume

    1

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    10

  • Pages from-to

  • UT code for WoS article

    000271511000007

  • EID of the result in the Scopus database