Investigation of the negative ions in Ar/O2 plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F11%3A00363960" target="_blank" >RIV/68378271:_____/11:00363960 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1002/ppap.201000195" target="_blank" >http://dx.doi.org/10.1002/ppap.201000195</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/ppap.201000195" target="_blank" >10.1002/ppap.201000195</a>

Result language

angličtina

Original language name

Investigation of the negative ions in Ar/O2 plasma of magnetron sputtering discharge with Al:Zn target by ion mass spectrometry

Original language description

The magnetron sputtering discharge used to deposit aluminum-doped zinc oxide was analyzed by energy-resolved ion mass spectrometry. The flux of negative ions was measured at three radial positions in the plane of the substrate holder. The oxygen flow fO2was varied from 0 to 17 sccm to investigate the discharge in all operation modes, i.e., metallic, transition, and oxide mode of sputtering. The existence of negative ions was determined from the energy spectra.Main attention was devoted to the investigation of O , O 2 , AlO , AlO 2 , ZnO , ZnO 2 , and AlO 3 negative ions and correlations of their intensities in the energy spectrum with discharge parameters (cathode voltage, magnetron power, and gas pressure). It was found that (i) intensities of negative ions exhibit maxima in the vicinity of transition between the metallic and transition mode of sputtering and (ii) in the oxide mode intensities of these ions are saturated.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2011

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Processes and Polymers

ISSN

1612-8850

e-ISSN

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Volume of the periodical

8

Issue of the periodical within the volume

5

Country of publishing house

DE - GERMANY

Number of pages

6

Pages from-to

459-464

UT code for WoS article

000290633300011

EID of the result in the Scopus database

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