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From micro- to nanocrystalline diamond films

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F11%3A00390465" target="_blank" >RIV/68378271:_____/11:00390465 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    From micro- to nanocrystalline diamond films

  • Original language description

    In this study we compare different methods to deposit nanocrystalline diamond (NCD) films with low surface roughness required for various applications. Bias enhanced re-nucleation, argon and CO2 addition, CH4/H2 ratio variation and the influence of the pressure are mentioned. For diamond films deposition three different systems were used: (i) double bias enhanced hot filament chemical vapour deposition (HFCVD), (ii) focused microwave plasma (FMWP) and (iii) pulsed linear antenna microwave plasma (PLAMWP) system. The grain size and surface morphology of samples were evaluated from SEM (Scanning Electron Microscopy) images. The processes, which take place during the diamond deposition, are discussed in the article.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2011

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Proceeding of School of Vacuum Technology - Vacuum and Advanced Materials

  • ISBN

    978-80-969435-9-3

  • ISSN

  • e-ISSN

  • Number of pages

    6

  • Pages from-to

    14-19

  • Publisher name

    Slovenská vákuová spoločnosť

  • Place of publication

    Bratislava

  • Event location

    Štrbské Pleso

  • Event date

    Sep 8, 2011

  • Type of event by nationality

    EUR - Evropská akce

  • UT code for WoS article