Nanodiamond seeding of rough substrates
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F11%3A00433409" target="_blank" >RIV/68378271:_____/11:00433409 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Nanodiamond seeding of rough substrates
Original language description
Efficient growth of nanocrystalline diamond (NCD) requires nucleation enhancement before chemical vapour deposition step. Nanodiamond (ND) seeding is a commonly used technique that yields high nucleation densities. This technique is well established forconventional planar substrates with low surface roughness. However, many engineering application requires NCD grow on rough and/or non-planar substrates. In this work, we investigate quality of nanodiamond seeding on silicon substrates of high surface roughness (RMS roughness <1 mm). Seeded substrates and deposited diamond films were analysed by atomic force microscopy (AFM), scanning electron microscopy (SEM) and Raman spectroscopy. We discuss influence of nanodiamond particles in seeding solution andseeding technique on nucleation density and quality of deposited NCD film.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Instruments and methods for biology and medicine 2011, Conference proceedings
ISBN
978-80-01-04915-0
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
11-15
Publisher name
Czech Technical University in Prague
Place of publication
Prague
Event location
Kladno
Event date
Jun 2, 2011
Type of event by nationality
CST - Celostátní akce
UT code for WoS article
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