Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00432632" target="_blank" >RIV/68378271:_____/14:00432632 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1166/asem.2014.1573" target="_blank" >http://dx.doi.org/10.1166/asem.2014.1573</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1166/asem.2014.1573" target="_blank" >10.1166/asem.2014.1573</a>

Result language
angličtina
Original language name
Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching
Original language description
In this technologically oriented study, the mask-free surface structuring of micro- and nanocrystalline diamond thin films is presented. The structuring of diamond films was performed by the reactive ion plasma etching in capacitively coupled radiofrequency plasma using different plasma chemistries (i.e. gas mixtures: O2, CF4, SF6 and Ar). We found that employing only oxygen plasma results in the formation of diamond nanowhiskers. Adding a small amount of CF4 makes the surface flatter. Argon containinggas mixture leads to smooth diamond surface without any whiskers. The etching mechanism is discussed with respect to the primary diamond morphology (micro- vs. nano-crystalline) and the used gas mixture.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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