Multitarget sputtering of PZT-containing mixed oxide thin films onto copper-coated kapton substrates

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00486358" target="_blank" >RIV/68378271:_____/14:00486358 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1109/OMEE.2014.6912320" target="_blank" >http://dx.doi.org/10.1109/OMEE.2014.6912320</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1109/OMEE.2014.6912320" target="_blank" >10.1109/OMEE.2014.6912320</a>

Result language
angličtina
Original language name
Multitarget sputtering of PZT-containing mixed oxide thin films onto copper-coated kapton substrates
Original language description
Large area film deposition was performed by means of multitarget reactive magnetron sputtering from 200 mm diameter metallic targets (Pb, Ti, Zr) onto Cu-coated Kapton HN substrates. High-power pulse sputtering has been employed for the Zr-target (or alternatively for the Ti-target). Film composition profiles were evaluated by XPS and RES. Piezoelectric properties were investigated by PFM.
Czech name
—
Czech description
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Project
—
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of International Conference On Oxide Materials For Electronic Engineering (OMEE)
ISBN
978-1-4799-5961-7
ISSN
—
e-ISSN
—
Number of pages
2
Pages from-to
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Publisher name
IEEE
Place of publication
New York
Event location
Lviv
Event date
May 26, 2014
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
000363330400002

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