Structure and mechanical properties of magnetron sputtered Zr-Ti-Cu-N films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F03%3A00000070" target="_blank" >RIV/49777513:23520/03:00000070 - isvavai.cz</a>
Alternative codes found
RIV/49777513:23520/03:00000341 RIV/49777513:23520/03:00000342
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Structure and mechanical properties of magnetron sputtered Zr-Ti-Cu-N films
Original language description
The article presents a detailed analysis of the structure-hardness relations in Zr-Cu-N and Zr-Ti-Cu-N films with low and high Ti content. These films were sputter deposited using a dc unbalanced magnetron equipped with a composed target, i.e. a round plate of diameter 100 mm made of ZrCu (90/10 at.%) alloy with a Ti (99.5%) fixing ring. The use of the Ti fixing ring of two internal diameters (70 or 50 mm) makes it possible to prepare Zr-Ti-Cu-N films with different Ti content, approximately with 15 or50 at.%, respectively. The properties of the Zr-Ti-Cu-N films were compared with those of Zr-Cu-N films reactively sputtered from the same magnetron but equipped with a ZrCu (90/10 at.%) target in a mixture of argon and nitrogen at a total press urepT =pAr+pN2 = 0.7 Pa.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
<a href="/en/project/ME%20529" target="_blank" >ME 529: Nanostructured thin films</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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