Multitarget sputtering of piezoelectric mixed oxide thin films onto flexible substrates
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00450607" target="_blank" >RIV/68378271:_____/15:00450607 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.4028/www.scientific.net/SSP.230.3" target="_blank" >http://dx.doi.org/10.4028/www.scientific.net/SSP.230.3</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.4028/www.scientific.net/SSP.230.3" target="_blank" >10.4028/www.scientific.net/SSP.230.3</a>
Alternative languages
Result language
angličtina
Original language name
Multitarget sputtering of piezoelectric mixed oxide thin films onto flexible substrates
Original language description
Large area film deposition was performed by means of multitarget reactive magnetron sputtering from metallic targets (Pb, Ti, Zr) with a diameter of 200 mm onto Cu-coated Kapton HN substrates. High-power pulse sputtering has been employed for the Zr-target (or alternatively for the Ti-target). Film composition profiles were evaluated by XPS and RBS. Piezoelectric properties were investigated by PFM.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Oxide Materials for Electronic Engineering - Fabrication, Properties and Application, vol. 230
ISBN
978-3-03835-428-4
ISSN
1662-9779
e-ISSN
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Number of pages
5
Pages from-to
3-7
Publisher name
Scientific.Net
Place of publication
Pfaffikon
Event location
Lviv
Event date
May 26, 2014
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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