Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00449520" target="_blank" >RIV/68378271:_____/15:00449520 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1088/0963-0252/24/3/035018" target="_blank" >http://dx.doi.org/10.1088/0963-0252/24/3/035018</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0963-0252/24/3/035018" target="_blank" >10.1088/0963-0252/24/3/035018</a>

Result language

angličtina

Original language name

Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS

Original language description

The ionization of sputtered Ti, Al, and C has been investigated in non-reactive high-power impulse magnetron sputtering discharges using Ar as a process gas. Two complementary techniques, time-resolved Langmuir probe diagnostics and a recently developedgridless ion meter, have for the first time been used to estimate absolute values of the ionized fractions of the sputtered material. It is found that by increasing the current density from 0.5 to 2.0 A cm2 there is a general increase of ne independentlyof target material and position in time with maximum plasma densities of about 1 1018?5 1018 m3 above the target race track. Also the ionized flux fraction, measured by ion meter, is increased when increasing the current density and reaches a maximum value of 78% in the Al discharge. By using the recorded ne and Te values to calculate the ionization probability of the sputtered material, and benchmark these results using the ion meter.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/LH12043" target="_blank" >LH12043: A Study of thin films systems based on Iron Pyrite (FeS2) for Photonic Applications.</a><br>

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science & Technology

ISSN

0963-0252

e-ISSN

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Volume of the periodical

24

Issue of the periodical within the volume

3

Country of publishing house

GB - UNITED KINGDOM

Number of pages

11

Pages from-to

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UT code for WoS article

000356857800043

EID of the result in the Scopus database

2-s2.0-84937554357