Effect of nitrogen content on the mechanical properties of amorphous SiCN films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00452834" target="_blank" >RIV/68378271:_____/15:00452834 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.4028/www.scientific.net/KEM.662.95" target="_blank" >http://dx.doi.org/10.4028/www.scientific.net/KEM.662.95</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.4028/www.scientific.net/KEM.662.95" target="_blank" >10.4028/www.scientific.net/KEM.662.95</a>
Alternative languages
Result language
angličtina
Original language name
Effect of nitrogen content on the mechanical properties of amorphous SiCN films
Original language description
Amorphous silicon carbonitride (a-SiCxNy) thin films were deposited using reactive magnetron sputtering of SiC target in the mixture of Ar and N gasses. The films with nitrogen content from 0 - 40 at.% were sputtered at various N2/Ar flow ratios in the range of 0 - 0.48. The as deposited films were additionally annealed in argon at 700 °C and vacuum at 900 °C. Analysis of mechanical properties was performed using the regular nanoindentation and short duration nanoindentation creep test (600 s).Hardnessof the a-SiCxNy films increases with the decrease of nitrogen content from approx. 19 GPa (a-Si30C30N40) to 22 GPa (a-SiC). Annealing of the films in inert atmosphere or vacuum leads to the increase of both the hardness and the elastic modulus. This increase is more pronounced for the SiC film than for the SiCN films. The nanoindentation creep test (600 s) showed that the rate of the steady-state creep growths with the increase of nitrogen content.
Czech name
—
Czech description
—
Classification
Type
D - Article in proceedings
CEP classification
JH - Ceramics, fire-proof materials and glass
OECD FORD branch
—
Result continuities
Project
<a href="/en/project/TA03010743" target="_blank" >TA03010743: Systems for acoustic emission characterization of mechanical properties and stability of thin film structures and functional surfaces</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Key Engineering Materials, Vol. 662
ISBN
978-3-03835-555-7
ISSN
1662-9795
e-ISSN
—
Number of pages
4
Pages from-to
95-98
Publisher name
Trans Tech Publications Ltd
Place of publication
Pfafficon
Event location
Stará Lesná
Event date
Nov 12, 2014
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
—