Mechanical properties and microstructural characterization of amorphous SiCxNy thin films after annealing beyond 1100°C
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F16%3A00470522" target="_blank" >RIV/68378271:_____/16:00470522 - isvavai.cz</a>
Alternative codes found
RIV/61989592:15310/16:33158917
Result on the web
<a href="http://dx.doi.org/10.1111/jace.14057" target="_blank" >http://dx.doi.org/10.1111/jace.14057</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1111/jace.14057" target="_blank" >10.1111/jace.14057</a>
Alternative languages
Result language
angličtina
Original language name
Mechanical properties and microstructural characterization of amorphous SiCxNy thin films after annealing beyond 1100°C
Original language description
The effect of thermal annealing on structure and mechanical properties of amorphous SiCxNy (y 0) thin films was investigated up to 1500°C in air and Ar. The SiCxNy films (2.2–3.4 μm) were deposited by reactive DC magnetron sputtering on Si, Al2O3 and α-SiC substrates without intentional heating and at 600°C. The SiC target with small excess of carbon was sputtered at various N2/Ar gas flow ratios (0–0.48). The nitrogen content in the films changes in the range 0–43 at.%. Hardness and elastic modulus (nanoindentation), change in film thickness, film composition, and structure (Raman spectroscopy, XRD) were investigated in dependence on annealing temperature and nitrogen content.All SiCxNy films preserve their amorphous structure up to 1500°C.The hardness of all as-deposited and both air- and Ar-annealed SiCxNy films decreases with growth of nitrogen content.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
<a href="/en/project/LO1305" target="_blank" >LO1305: Development of the center of advanced technologies and materials</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of the American Ceramic Society
ISSN
0002-7820
e-ISSN
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Volume of the periodical
99
Issue of the periodical within the volume
3
Country of publishing house
US - UNITED STATES
Number of pages
9
Pages from-to
996-1005
UT code for WoS article
000372189300038
EID of the result in the Scopus database
2-s2.0-84959493771