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(100) substrate processing optimization for fabrication of smooth boron doped epitaxial diamond layer by PE CVD

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00464790" target="_blank" >RIV/68378271:_____/15:00464790 - isvavai.cz</a>

  • Alternative codes found

    RIV/68407700:21460/15:00309680

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    (100) substrate processing optimization for fabrication of smooth boron doped epitaxial diamond layer by PE CVD

  • Original language description

    Boron doped diamond layers were grown in an SEKI AX5010 microwave plasma enhanced chemical vapour deposition system. Effect of surface preparation, i.e. polishing and O2/H2 plasma etching on epitaxial growth on type Ib (100) HPHT synthetic diamonds were investigated. Using optimized substrate preparation, smooth (RRMS ~ 1 nm) boron doped diamond layers with metallic conduction and free of un-epitaxial crystallites were grown with a relatively high growth rate of 3.7 μm/h. Diamond were characterized by optical microscopy, optical profilometry, atomic force microscopy and Hall effect.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

  • OECD FORD branch

    10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Result continuities

  • Project

    <a href="/en/project/GA13-31783S" target="_blank" >GA13-31783S: Study of interfacial charge transfer process on boron and phosphorus doped diamond in contact with electrolyte solution</a><br>

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2015

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    NANOCON 2014. 6th International conference proceedings

  • ISBN

    978-80-87294-53-6

  • ISSN

  • e-ISSN

  • Number of pages

    5

  • Pages from-to

    115-119

  • Publisher name

    TANGER

  • Place of publication

    Ostrava

  • Event location

    Brno

  • Event date

    Nov 5, 2014

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article

    000350636300018