High temperature nanoindentation testing of amorphous SiC and B4C thin films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F16%3A00470728" target="_blank" >RIV/68378271:_____/16:00470728 - isvavai.cz</a>
Alternative codes found
RIV/61989592:15310/16:33161932
Result on the web
<a href="http://dx.doi.org/10.4028/www.scientific.net/DDF.368.115" target="_blank" >http://dx.doi.org/10.4028/www.scientific.net/DDF.368.115</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.4028/www.scientific.net/DDF.368.115" target="_blank" >10.4028/www.scientific.net/DDF.368.115</a>

Result language
angličtina
Original language name
High temperature nanoindentation testing of amorphous SiC and B4C thin films
Original language description
Amorphous silicon carbide (a-SiC) and boron carbide (a-B4C) thin films were deposited using reactive magnetron sputtering of SiC and B4C target, respectively. Nanoindentation tests performed up to 450 °C in air were performed to explore and compare their hardness and elastic modulus. Hardness of a-B4C film decreases at smaller rate in comparison to a-SiC film up to 450 °C. Similarly, elastic modulus value of B4C is more stable with temperature than that of a-SiC.
Czech name
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Czech description
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Project
<a href="/en/project/TA04011156" target="_blank" >TA04011156: Functional thin film optical structures.</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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