Modified high frequency probe approach for diagnostics of highly reactive plasma
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F19%3A00518124" target="_blank" >RIV/68378271:_____/19:00518124 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1088/1361-6595/ab506c" target="_blank" >https://doi.org/10.1088/1361-6595/ab506c</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1361-6595/ab506c" target="_blank" >10.1088/1361-6595/ab506c</a>
Alternative languages
Result language
angličtina
Original language name
Modified high frequency probe approach for diagnostics of highly reactive plasma
Original language description
The paper introduces a modified approach of time resolved in situ diagnostics of highly reactive discharges (C2H2 in our case) usually used for a deposition process of various non-conductive thin films. Reactive plasma could create an insulating film onto inserted diagnostic tools, which distorts measured data and makes their processing unreliable, a typical problem of Langmuir probe measurements. The proposed approach utilizes a so-called radiofrequency (rf) Sobolewski probe for ion flux measurement which is further modified to also obtain the electron temperature in some cases and the ion density. In this work, we introduce the procedure where measured rf probe characteristics are transformed towards I–V curves of the plasma sheath with subtracted capacitive current.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Sources Science & Technology
ISSN
1361-6595
e-ISSN
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Volume of the periodical
28
Issue of the periodical within the volume
11
Country of publishing house
GB - UNITED KINGDOM
Number of pages
10
Pages from-to
1-10
UT code for WoS article
000499812800001
EID of the result in the Scopus database
2-s2.0-85080866046