CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00577303" target="_blank" >RIV/68378271:_____/23:00577303 - isvavai.cz</a>

Alternative codes found

RIV/61989592:15310/23:73621390

Result on the web

<a href="https://hdl.handle.net/11104/0346510" target="_blank" >https://hdl.handle.net/11104/0346510</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/6.0002902" target="_blank" >10.1116/6.0002902</a>

Result language

angličtina

Original language name

CuFeO2 prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering

Original language description

In this study, thin films of CuFeO2 were prepared using radio frequency reactive sputtering (RF) and reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma (HiPIMS-ECWR). The plasma was characterized using an RF ion probe. Plasma density, tail electron energy, and electron temperature were extracted from the measured data. The films were deposited on fluorine-doped tin oxide-coated glass and quartz glass, with the substrates being heated during the deposition process. The final delafossite CuFeO2 structure was formed after annealing in an argon gas flow at 550–600 °C. The ideal deposition conditions were found to be with a stoichiometric ratio of Cu:Fe = 1:1, which was the optimal condition for creating the delafossite CuFeO2 structure. The measured optical bandgap of CuFeO2 was 1.4 eV.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2023

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films

ISSN

0734-2101

e-ISSN

1520-8559

Volume of the periodical

41

Issue of the periodical within the volume

6

Country of publishing house

US - UNITED STATES

Number of pages

13

Pages from-to

063005

UT code for WoS article

001084484900003

EID of the result in the Scopus database

2-s2.0-85173238774